An original tuneable plasma process for the synthesis of tailored nanoparticles

Emile Haye; Loris CHAVEE; Florian Bocchese; YAN BUSBY; Mathieu Da Silva Pires; Laurent HOUSSIAU; Jean-Francois Colomer; Jean-Jacques Pireaux; Stéphane Lucas

doi:10.3390/asec2020-07605

An original tuneable plasma process for the synthesis of tailored nanoparticles

Emile Haye, Loris CHAVEE, Florian Bocchese, YAN BUSBY, Mathieu Da Silva Pires, Laurent HOUSSIAU, Jean-Francois Colomer, Jean-Jacques Pireaux, Stéphane Lucas

Research output: Contribution in Book/Catalog/Report/Conference proceeding › Conference contribution

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Original language	English
Title of host publication	1st International Electronic Conference on Applied Sciences session Nanotechnology and Applied Nanosciences
Publisher	Multidisciplinary Digital Publishing Institute (MDPI)
DOIs	https://doi.org/10.3390/asec2020-07605
Publication status	Published - 9 Nov 2020

Publication series

Name	Proceedings of 1st International Electronic Conference on Applied Sciences

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10.3390/asec2020-07605

2020_HayeEEtAl_articleFinal published version, 749 KB

Morphology - Imaging
Cecchet, F. (Manager) & Renard, H.-F. (Manager)
Technological Platform Morphology - Imaging
Facility/equipment: Technological Platform
Physical Chemistry and characterization(PC2)
Wouters, J. (Manager), Aprile, C. (Manager) & Fusaro, L. (Manager)
Technological Platform Physical Chemistry and characterization
Facility/equipment: Technological Platform
Synthesis, Irradiation and Analysis of Materials (SIAM)
Louette, P. (Manager), Colaux, J. (Manager), Felten, A. (Manager), Tabarrant, T. (Operator), COME, F. (Operator) & Debarsy, P.-L. (Manager)
Technological Platform Synthesis, Irradiation and Analysis of Materials
Facility/equipment: Technological Platform

Cite this

Haye, E., CHAVEE, L., Bocchese, F., BUSBY, YAN., Da Silva Pires, M., HOUSSIAU, L., Colomer, J.-F., Pireaux, J.-J., & Lucas, S. (2020). An original tuneable plasma process for the synthesis of tailored nanoparticles. In 1st International Electronic Conference on Applied Sciences session Nanotechnology and Applied Nanosciences (Proceedings of 1st International Electronic Conference on Applied Sciences). Multidisciplinary Digital Publishing Institute (MDPI). https://doi.org/10.3390/asec2020-07605

Haye, Emile ; CHAVEE, Loris ; Bocchese, Florian et al. / An original tuneable plasma process for the synthesis of tailored nanoparticles. 1st International Electronic Conference on Applied Sciences session Nanotechnology and Applied Nanosciences. Multidisciplinary Digital Publishing Institute (MDPI), 2020. (Proceedings of 1st International Electronic Conference on Applied Sciences).

@inproceedings{f68e87ee9c18482e9e7dd445bdcb8775,

title = "An original tuneable plasma process for the synthesis of tailored nanoparticles",

author = "Emile Haye and Loris CHAVEE and Florian Bocchese and YAN BUSBY and {Da Silva Pires}, Mathieu and Laurent HOUSSIAU and Jean-Francois Colomer and Jean-Jacques Pireaux and St{\'e}phane Lucas",

year = "2020",

month = nov,

day = "9",

doi = "10.3390/asec2020-07605",

language = "English",

series = "Proceedings of 1st International Electronic Conference on Applied Sciences",

publisher = "Multidisciplinary Digital Publishing Institute (MDPI)",

booktitle = "1st International Electronic Conference on Applied Sciences session Nanotechnology and Applied Nanosciences",

address = "Switzerland",

}

Haye, E , CHAVEE, L , Bocchese, F, BUSBY, YAN, Da Silva Pires, M , HOUSSIAU, L , Colomer, J-F , Pireaux, J-J & Lucas, S 2020, An original tuneable plasma process for the synthesis of tailored nanoparticles. in 1st International Electronic Conference on Applied Sciences session Nanotechnology and Applied Nanosciences. Proceedings of 1st International Electronic Conference on Applied Sciences, Multidisciplinary Digital Publishing Institute (MDPI). https://doi.org/10.3390/asec2020-07605

An original tuneable plasma process for the synthesis of tailored nanoparticles. / Haye, Emile ; CHAVEE, Loris ; Bocchese, Florian et al.
1st International Electronic Conference on Applied Sciences session Nanotechnology and Applied Nanosciences. Multidisciplinary Digital Publishing Institute (MDPI), 2020. (Proceedings of 1st International Electronic Conference on Applied Sciences).

Research output: Contribution in Book/Catalog/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - An original tuneable plasma process for the synthesis of tailored nanoparticles

AU - Haye, Emile

AU - CHAVEE, Loris

AU - Bocchese, Florian

AU - BUSBY, YAN

AU - Da Silva Pires, Mathieu

AU - HOUSSIAU, Laurent

AU - Colomer, Jean-Francois

AU - Pireaux, Jean-Jacques

AU - Lucas, Stéphane

PY - 2020/11/9

Y1 - 2020/11/9

U2 - 10.3390/asec2020-07605

DO - 10.3390/asec2020-07605

M3 - Conference contribution

T3 - Proceedings of 1st International Electronic Conference on Applied Sciences

BT - 1st International Electronic Conference on Applied Sciences session Nanotechnology and Applied Nanosciences

PB - Multidisciplinary Digital Publishing Institute (MDPI)

ER -

Haye E , CHAVEE L , Bocchese F, BUSBY YAN, Da Silva Pires M , HOUSSIAU L et al. An original tuneable plasma process for the synthesis of tailored nanoparticles. In 1st International Electronic Conference on Applied Sciences session Nanotechnology and Applied Nanosciences. Multidisciplinary Digital Publishing Institute (MDPI). 2020. (Proceedings of 1st International Electronic Conference on Applied Sciences). doi: 10.3390/asec2020-07605

An original tuneable plasma process for the synthesis of tailored nanoparticles

Publication series

Access to Document

Equipment

Morphology - Imaging

Physical Chemistry and characterization(PC2)

Synthesis, Irradiation and Analysis of Materials (SIAM)

Cite this