TY - JOUR
T1 - AFM and XPS characterization of the Si(111) surface after thermal treatment
AU - Lamontagne, B.
AU - Guay, D.
AU - Roy, D.
AU - Sporken, Robert
AU - Caudano, Roland
PY - 1995
Y1 - 1995
N2 - Several phases of the thermal cleaning of crystalline Si(111) have been studied using AFM and XPS. The use of a sample exposed to a high thermal gradient has allowed us to investigate various surface morphologies on the same sample: formation of voids (native oxide decomposition), islands (pinning centers), rough area, flat and clean surface. These observations provide a novel description of the different steps involved in the thermal cleaning of a crystalline surface.
AB - Several phases of the thermal cleaning of crystalline Si(111) have been studied using AFM and XPS. The use of a sample exposed to a high thermal gradient has allowed us to investigate various surface morphologies on the same sample: formation of voids (native oxide decomposition), islands (pinning centers), rough area, flat and clean surface. These observations provide a novel description of the different steps involved in the thermal cleaning of a crystalline surface.
U2 - 10.1016/0169-4332(95)00154-9
DO - 10.1016/0169-4332(95)00154-9
M3 - Article
SN - 0169-4332
VL - 90
SP - 481
EP - 487
JO - Applied Surface Science
JF - Applied Surface Science
IS - 4
ER -