AFM and XPS characterization of the Si(111) surface after thermal treatment

B. Lamontagne, D. Guay, D. Roy, Robert Sporken, Roland Caudano

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Several phases of the thermal cleaning of crystalline Si(111) have been studied using AFM and XPS. The use of a sample exposed to a high thermal gradient has allowed us to investigate various surface morphologies on the same sample: formation of voids (native oxide decomposition), islands (pinning centers), rough area, flat and clean surface. These observations provide a novel description of the different steps involved in the thermal cleaning of a crystalline surface.
    Original languageEnglish
    Pages (from-to)481-487
    JournalApplied Surface Science
    Volume90
    Issue number4
    DOIs
    Publication statusPublished - 1995

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