Advanced characterization of high-k materials: a nuclear approach

B. Brijs; C. Huyghebaert; S. Nauwelaerts; M. Caymax; W. Vandervorst; K. Nakajima; K. Kimura; A. Bergamier; G. Döllinger; W.N. Lennard; Guy Terwagne; A. Vantomme

doi:10.1016/S0168-583X(02)00468-8

Advanced characterization of high-k materials: a nuclear approach

B. Brijs, C. Huyghebaert, S. Nauwelaerts, M. Caymax, W. Vandervorst, K. Nakajima, K. Kimura, A. Bergamier, G. Döllinger, W.N. Lennard, Guy Terwagne, A. Vantomme

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Abstract

The determination of the composition of thin (1.5–3 nm) high-k layers ZrO2/Al2O3 becomes more and more important in microelectronics. High resolution Rutherford backscattering spectrometry and high resolution elastic recoil detection can achieve depth resolutions down to 1 nm while Rutherford backscattering spectrometry and nuclear reaction analysis are perfectly suited to quantify the zirconium, the oxygen and the aluminum content. The goal of this paper is to investigate the use of nuclear techniques for the characterization of thin high-k materials.

Original language	English
Pages (from-to)	505-509
Number of pages	5
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	190
DOIs	https://doi.org/10.1016/S0168-583X(02)00468-8
Publication status	Published - 2002

Keywords

Nuclear reaction analysis
Thin film
High-k
Elastic recoil detection
Rutherford backscattering

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10.1016/S0168-583X(02)00468-8

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Brijs, B., Huyghebaert, C., Nauwelaerts, S., Caymax, M., Vandervorst, W., Nakajima, K., Kimura, K., Bergamier, A., Döllinger, G., Lennard, W. N., Terwagne, G., & Vantomme, A. (2002). Advanced characterization of high-k materials: a nuclear approach. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 190, 505-509. https://doi.org/10.1016/S0168-583X(02)00468-8

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abstract = "The determination of the composition of thin (1.5–3 nm) high-k layers ZrO2/Al2O3 becomes more and more important in microelectronics. High resolution Rutherford backscattering spectrometry and high resolution elastic recoil detection can achieve depth resolutions down to 1 nm while Rutherford backscattering spectrometry and nuclear reaction analysis are perfectly suited to quantify the zirconium, the oxygen and the aluminum content. The goal of this paper is to investigate the use of nuclear techniques for the characterization of thin high-k materials.",

keywords = " Nuclear reaction analysis, Thin film, High-k, Elastic recoil detection, Rutherford backscattering",

author = "B. Brijs and C. Huyghebaert and S. Nauwelaerts and M. Caymax and W. Vandervorst and K. Nakajima and K. Kimura and A. Bergamier and G. D{\"o}llinger and W.N. Lennard and Guy Terwagne and A. Vantomme",

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doi = "10.1016/S0168-583X(02)00468-8",

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Brijs, B, Huyghebaert, C, Nauwelaerts, S, Caymax, M, Vandervorst, W, Nakajima, K, Kimura, K, Bergamier, A, Döllinger, G, Lennard, WN, Terwagne, G & Vantomme, A 2002, 'Advanced characterization of high-k materials: a nuclear approach', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 190, pp. 505-509. https://doi.org/10.1016/S0168-583X(02)00468-8

TY - JOUR

T1 - Advanced characterization of high-k materials

T2 - a nuclear approach

AU - Brijs, B.

AU - Huyghebaert, C.

AU - Nauwelaerts, S.

AU - Caymax, M.

AU - Vandervorst, W.

AU - Nakajima, K.

AU - Kimura, K.

AU - Bergamier, A.

AU - Döllinger, G.

AU - Lennard, W.N.

AU - Terwagne, Guy

AU - Vantomme, A.

PY - 2002

Y1 - 2002

N2 - The determination of the composition of thin (1.5–3 nm) high-k layers ZrO2/Al2O3 becomes more and more important in microelectronics. High resolution Rutherford backscattering spectrometry and high resolution elastic recoil detection can achieve depth resolutions down to 1 nm while Rutherford backscattering spectrometry and nuclear reaction analysis are perfectly suited to quantify the zirconium, the oxygen and the aluminum content. The goal of this paper is to investigate the use of nuclear techniques for the characterization of thin high-k materials.

AB - The determination of the composition of thin (1.5–3 nm) high-k layers ZrO2/Al2O3 becomes more and more important in microelectronics. High resolution Rutherford backscattering spectrometry and high resolution elastic recoil detection can achieve depth resolutions down to 1 nm while Rutherford backscattering spectrometry and nuclear reaction analysis are perfectly suited to quantify the zirconium, the oxygen and the aluminum content. The goal of this paper is to investigate the use of nuclear techniques for the characterization of thin high-k materials.

KW - Nuclear reaction analysis

KW - Thin film

KW - High-k

KW - Elastic recoil detection

KW - Rutherford backscattering

U2 - 10.1016/S0168-583X(02)00468-8

DO - 10.1016/S0168-583X(02)00468-8

M3 - Article

SN - 0168-583X

VL - 190

SP - 505

EP - 509

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

ER -

Advanced characterization of high-k materials: a nuclear approach

Abstract

Keywords

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