A two step process to form organothiol self-assembled monolayers on nickel surfaces

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Abstract

This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.

Original languageEnglish
Pages (from-to)247-253
Number of pages7
JournalThin Solid Films
Volume522
DOIs
Publication statusPublished - 1 Nov 2012

Fingerprint

Self assembled monolayers
Nickel
hydrazine
nickel
Nickel oxide
nickel oxides
Hydrazine
hydrazines
meteorology
assembling
Sulfhydryl Compounds
thiols
Oxides
Monolayers
Ethanol
ethyl alcohol
Oxidation
oxidation
oxides

Keywords

  • Hydrazine monohydrate
  • Nickel oxide reduction
  • Self-assembled monolayers
  • X-ray photoelectron spectroscopy

Cite this

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title = "A two step process to form organothiol self-assembled monolayers on nickel surfaces",
abstract = "This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. {\circledC} 2012 Elsevier B.V.",
keywords = "Hydrazine monohydrate, Nickel oxide reduction, Self-assembled monolayers, X-ray photoelectron spectroscopy",
author = "Sundar Rajalingam and S{\'e}bastien Devillers and Joseph Delhalle and Zineb Mekhalif",
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T1 - A two step process to form organothiol self-assembled monolayers on nickel surfaces

AU - Rajalingam, Sundar

AU - Devillers, Sébastien

AU - Delhalle, Joseph

AU - Mekhalif, Zineb

PY - 2012/11/1

Y1 - 2012/11/1

N2 - This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.

AB - This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.

KW - Hydrazine monohydrate

KW - Nickel oxide reduction

KW - Self-assembled monolayers

KW - X-ray photoelectron spectroscopy

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DO - 10.1016/j.tsf.2012.08.036

M3 - Article

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JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

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