This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.
|Number of pages||7|
|Journal||Thin Solid Films|
|Publication status||Published - 1 Nov 2012|
- Hydrazine monohydrate
- Nickel oxide reduction
- Self-assembled monolayers
- X-ray photoelectron spectroscopy
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Synthesis, Irradiation and Analysis of Materials (SIAM)
Pierre Louette (Manager), Julien Colaux (Manager), Alexandre Felten (Manager) & Jorge Humberto Mejia Mendoza (Manager)Technological Platform Synthesis, Irradiation and Analysis of Materials
Facility/equipment: Technological Platform