A two step process to form organothiol self-assembled monolayers on nickel surfaces

Sundar Rajalingam, Sébastien Devillers, Joseph Delhalle, Zineb Mekhalif

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Abstract

This paper reports on an original and simple two step process of nickel oxide layer reduction and rapid self-assembling of n-dodecanethiol on nickel surfaces. Chemical reduction of the oxide layer present on polycrystalline nickel surface using hydrazine monohydrate in alkaline media is very fast and facilitates the formation of a dense self-assembled monolayer of thiol from its ethanol solution within six hours. The developed method is simple and the resulting monolayer prevents the nickel surface oxidation when exposed to atmospheric conditions. © 2012 Elsevier B.V.

Original languageEnglish
Pages (from-to)247-253
Number of pages7
JournalThin Solid Films
Volume522
DOIs
Publication statusPublished - 1 Nov 2012

Keywords

  • Hydrazine monohydrate
  • Nickel oxide reduction
  • Self-assembled monolayers
  • X-ray photoelectron spectroscopy

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