A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration

Nordine Hendaoui, Aladin Mani, Ning Liu, Syed M. Tofail, Christophe Silien, André Peremans

Research output: Research - peer-reviewArticle

Abstract

A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.

LanguageEnglish
Pages574-579
Number of pages6
JournalOptics Communications
Volume382
DOIs
StatePublished - 1 Jan 2017

Fingerprint

standing waves
spatial resolution
microscopy
configurations
diffraction
Adsorbates
Microscopic examination
Diffraction
Infrared radiation
Imaging techniques
Computer simulation
micrometers
methylidyne
simulation

Keywords

  • ATR configuration
  • Far field
  • Infrared microscopy
  • Label free
  • Super-resolution

Cite this

@article{898cf83f2f154154b84eea1ce299127d,
title = "A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration",
abstract = "A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.",
keywords = "ATR configuration, Far field, Infrared microscopy, Label free, Super-resolution",
author = "Nordine Hendaoui and Aladin Mani and Ning Liu and Tofail, {Syed M.} and Christophe Silien and André Peremans",
year = "2017",
month = "1",
doi = "10.1016/j.optcom.2016.08.034",
volume = "382",
pages = "574--579",
journal = "Optics Communications",
issn = "0030-4018",
publisher = "Elsevier",

}

TY - JOUR

T1 - A method to overcome the diffraction limit in infrared microscopy using standing waves in an attenuated total reflection configuration

AU - Hendaoui,Nordine

AU - Mani,Aladin

AU - Liu,Ning

AU - Tofail,Syed M.

AU - Silien,Christophe

AU - Peremans,André

PY - 2017/1/1

Y1 - 2017/1/1

N2 - A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.

AB - A method is proposed to overcome the diffraction limit of spatial resolution in infrared microscopy. To achieve this, standing waves in an attenuated total reflection configuration were generated to spatially modulate the absorbance of adsorbate vibrational transitions. A numerical simulation was undertaken. It showed that chemical imaging with a spatial resolution of approximately 100 nm is achievable in the case of self-assembled patterns (ofoctdecyltrichlorosilane [CH3-(CH2)17-SiCl3]), when probing the methyl modes located near 3.5 micrometres.

KW - ATR configuration

KW - Far field

KW - Infrared microscopy

KW - Label free

KW - Super-resolution

UR - http://www.scopus.com/inward/record.url?scp=84983605938&partnerID=8YFLogxK

U2 - 10.1016/j.optcom.2016.08.034

DO - 10.1016/j.optcom.2016.08.034

M3 - Article

VL - 382

SP - 574

EP - 579

JO - Optics Communications

T2 - Optics Communications

JF - Optics Communications

SN - 0030-4018

ER -