The purpose of this research work is to investigate by local electrochemical methods (micrometer scale) the behaviour of Cu, Ni and CU/Ni substrates modified by three molecular connectors : n-dodecanethiol, le n-dodecyltrichlorosilane et le n-dodecyltrimethoxysilane. The goals are the qualification by such techniques (SKP and SVET), in conjunction with spectroscopic techniques such as XPS and ToF-SIMS, the quality of such monolayers and their resistance to aggressive conditions (ambient atmosphere, acid, base and halogenide containing solutions).
|Effective start/end date||1/04/02 → 1/12/08|
- deterioration of resistance
- Scanning Kelvin Probe (or SKP)
- Scanning Vibrating Electrode Technique (or SVET)
- Local electrochemistry
- self-assembled monolayers
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