Multiscale numerical simulations of the growth and electronic properties of chemically doped graphene.

Project: Research

Description

By means of multiscale simulations based on ab-initio and kinetic Monte-Carlo methods, we aim at :

1) Understand the mechanism of production of chemically modified graphene expose to nitrogen plasma.

2) Understand the growth mechanism in CVD production of doped graphene on Cu surface.

3) Predict the experimental fingerprints and the physical properties of the obtained structures.
StatusFinished
Effective start/end date1/07/1330/06/15

Keywords

  • Graphene / Numerical simulations / Ab-initio / kinetic Monte-Carlo / Chemical Vapor Deposition /Plasma Treatment / STM