Project Details
Description
the project aims to establish the methodologies for characterisation of high-k dielectrics for the future (sub-) 100 nm device technologies. The objectives include the fast and non-destructive analysis of single and multi-ellipsometry, X-ray reflectometry, angular resolved, XPS off-line tools with emphasis on the aspects related to quantification and depth resolution (attenuated IR ion mass techniques, ERD and ELS).
Acronym | CUHKO |
---|---|
Status | Finished |
Effective start/end date | 1/01/02 → 31/12/04 |
Keywords
- XPS
- dielectric
- TOF-SIMS
- oxide ultra-thin layer
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