Cesium/Xenon co-sputtering, a new approach for a quantitative depth profiling method in ToF-SIMS

Project: PHD

Project Details

Description

The thesis aims at developing a semi-quantitative approach for depth-profiling with ToF-SIMS by using a user defined mixture of Cs and Xe in the sputtering beam. Moreover, the project leads to a fudamental understanding of MCs cluster formation and ionization mechanisms.
StatusFinished
Effective start/end date1/09/0130/09/07

Keywords

  • quantification
  • depth profiling
  • Cesium
  • SIMS