Project Details
Description
The thesis aims at developing a semi-quantitative approach for depth-profiling with ToF-SIMS by using a user defined mixture of Cs and Xe in the sputtering beam. Moreover, the project leads to a fudamental understanding of MCs cluster formation and ionization mechanisms.
Status | Finished |
---|---|
Effective start/end date | 1/09/01 → 30/09/07 |
Keywords
- quantification
- depth profiling
- Cesium
- SIMS
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