Cesium/Xenon co-sputtering, a new approach for a quantitative depth profiling method in ToF-SIMS

Project: PHD

Project Details


The thesis aims at developing a semi-quantitative approach for depth-profiling with ToF-SIMS by using a user defined mixture of Cs and Xe in the sputtering beam. Moreover, the project leads to a fudamental understanding of MCs cluster formation and ionization mechanisms.
Effective start/end date1/09/0130/09/07


  • quantification
  • depth profiling
  • Cesium
  • SIMS


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