Chemistry
Procedure
100%
Plasma
66%
Inductively Coupled Plasma Method
66%
Glass
66%
Liquid Film
66%
Catalyst
66%
Nanoparticle
66%
Magnetron Sputtering
33%
Thickness
33%
Application
27%
Environmental Impact
24%
Metal
22%
Carbon
22%
Density
16%
Density Functional Theory
16%
Molecular Dynamics
16%
Emissivity
16%
Grain Boundary
16%
Chemical Kinetics Characteristics
16%
Industry
16%
Amount
16%
Thin Film Growth
16%
Xerogels
13%
Chemical Deposition
13%
Synthesis (Chemical)
11%
Metallocene
11%
Nucleation
11%
Mixture
11%
Pressure
11%
Surface Area
11%
Time
11%
Environmental Friendliness
11%
Energetics
11%
Waste Material
11%
Phase Composition
11%
Solvent
11%
Catalyst Synthesis
11%
Material Science
Magnetron Sputtering
80%
Titanium Dioxide
66%
ZnO
66%
Actuator
66%
Coating
66%
Coil
66%
Optical Property
53%
Sensor
50%
Delamination
40%
Niobium
33%
Al2O3
26%
Durability
26%
Impurity
26%
Silicon
16%
Devices
16%
Materials Mechanics
16%
Indium Tin Oxide
13%
Oxide
13%
Amorphous Material
13%
Conductivity
13%
Electronic Property
13%
Density
13%
Crystallite
13%
Droplet
13%
Silver
13%
Defect Density
11%
Physics
Cryogenics
66%
Gravitational Wave
66%
Detection
66%
Natural Satellites
66%
Growth
66%
Substrates
50%
Gravitational Wave Detectors
50%
Delamination
40%
Simulation
33%
Magnetron Sputtering
33%
Earth
33%
Differences
16%
Antenna
16%
Magnitude
16%
Density Functional Theory
16%
Utilization
16%
Island
16%
Thin Films
16%
Film Thickness
16%
Kinetics
16%
Grain Boundaries
16%
Emissivity
16%
Monte Carlo
16%
Probe
16%
ZnO
16%
Coating
16%
Durability
13%
Substitutes
13%