INIS
coatings
96%
magnetrons
89%
carbon
85%
particles
80%
sputtering
79%
thin films
78%
depth
68%
nanoparticles
64%
x radiation
54%
films
51%
growth
50%
nanostructures
48%
copper
46%
emission
45%
nitrogen
44%
carbon nitrides
41%
layers
39%
range
39%
plasma
39%
backscattering
35%
nitrogen 15
31%
carbon 12
31%
investigations
31%
optics
31%
silicon carbides
31%
gases
29%
ion beams
29%
substrates
29%
MeV range
28%
mechanical properties
27%
diffusion
27%
rutherford backscattering spectrometry
26%
spectrometry
25%
protons
25%
nuclear reactions
25%
annealing
24%
hydrogenation
23%
energy
23%
ions
23%
density
23%
lungs
22%
surfaces
21%
chemical vapor deposition
21%
mass spectrometry
21%
yields
21%
safety margins
20%
nra
20%
doses
20%
rats
20%
electrons
20%
Material Science
Thin Films
100%
Magnetron Sputtering
99%
Film
83%
Nitride Compound
67%
Rutherford Backscattering Spectrometry
60%
Carbon Nitride
46%
Density
42%
Optical Property
38%
High Power Impulse Magnetron Sputtering
38%
Nanocrystalline Material
34%
Ion Implantation
31%
Silicon
31%
Lithography
31%
Titanium Dioxide
31%
Amorphous Hydrogenated Carbon
29%
Scanning Electron Microscopy
28%
Transition Metal
20%
Chromium
20%
Nanoparticle
17%
X-Ray Photoelectron Spectroscopy
16%
Metal-Based Nanoparticles
15%
Tumor
15%
Solar Cell
15%
Nanospheres
15%
ZnO
15%
Oxidation Reaction
15%
X-Ray Fluorescence Spectroscopy
15%
Physical Vapor Deposition
15%
Metal Nanoparticle
15%
Delamination
15%
Chalcogenides
15%
Transmission Electron Microscopy
15%
Gallium
15%
Surface Roughness
15%
Silicon Dioxide
15%
Optical Coating
15%
Germanium
15%
Porous Silicon
11%
X-Ray Diffraction
9%
Chemical Bonding
9%
Nanoindentation
9%
Amorphous Material
7%
Film Thickness
7%
Materials Property
7%
Plasma Deposition
7%
Annealing
7%
Cell Growth
7%
Plasma-Enhanced Chemical Vapor Deposition
7%
Fibroblast
7%
Surface Diffusion
7%
Keyphrases
Nanocrystal Assemblies
31%
Colloidal Nanocrystals
31%
Nitride Complexes
15%
Carbon Nitride
15%
Secondary Electron Yield
15%
C3N4
15%
Electrostatic Accelerator
15%
Calibration Method
15%
Voltage Calibration
15%
Fluorescence Yield
15%
Leaching Conditions
15%
Pyrite Oxidation
15%
Geological Profile
15%
Hypervelocity Impact
15%
Microbiota
15%
Mesoporous Silicon
15%
Porous Silicon Composites
15%
Frequency Effect
15%
Cycle Effect
15%
Chromium Nitride
15%
Pulsed Reactive Magnetron Sputtering
15%
Inorganic Resist
15%
Ultrafine Particles
15%
Fine Particles
15%
Coarse-to-fine
15%
Coarse Particles
15%
Occupational Exposure
15%
Building Retrofit
15%
Upper Jurassic
15%
Tiaojishan Formation
15%
Tail Feather
15%
Magnetron Discharge
15%
Optics
15%
Transition Metal Nitrides
15%
Microtexture
15%
Hollow Cathode Discharge
15%
Bipolar HiPIMS
15%
Plasma Characteristics
15%
CIGS Solar Cells
15%
Carbon Coating
15%
Lower Secondary
15%
Momentum Flux
15%
Back Electrode
15%
PVD Method
15%
Hydrocarbon Precursors
15%
Lithography
15%
Neutral Salt Spray
15%
Salt Spray Ageing
15%
Ultra-high Dose Rate Radiation
15%
Proton Dosimetry
15%
