Joint international meeting of the electrochemical society

Activity: Participating in or organising an event typesParticipation in conference


Communication orale: "Copper-SilK* semiconductor dielectric interface: XPS surface anlysis and RF plasma treatment of the resin". Co-auteurs: J.-J. Lemaire, A. Rajagopal, C. Gregoire, M.R. Baklanov, S. Vanhaelemeersch, K. Maex & J;-J. Waeterloos
Period17 Oct 199922 Oct 1999
Event typeConference
LocationHonolulu, Etats-UnisShow on map