ALTECH 2003 <Analytical Techniques for Semiconductor Materials and Process Characterization >, 203 th ECS meeting

Activity: Participating in or organising an event typesParticipation in conference


<Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques > H. Bender, Th. Conard, O. Richard, B. Brijs, J. Petry, W. Vandevorst, Ch. Defranoux, N. Rochat, C. Wyan, P. Mack, J. Wolstenholmhe, R. Vitchev, L. H
Period27 Apr 20032 May 2003
Event typeConference
LocationParis, FranceShow on map